process "TSMC 0.18um 6ML worse case model for Panasonic CPU migration project" {
	background_dielectric_constant 1.000000
}
diffusion "N_SOURCE_DRAIN" {
	thickness 0.000000
	resistivity 6.800000 
}
diffusion "P_SOURCE_DRAIN" {
	thickness 0.000000
	resistivity 7.200000 
}
conductor "POLYCIDE" {
	min_spacing 0.250000
	min_width 0.180000 
	height 0.290000 
	thickness 0.210000 
	resistivity 10.300000  
	gate_forming_layer true 
}
conductor "METAL_1" {
	min_spacing 0.230000
	min_width 0.230000 
	height 0.840000 
	thickness 0.557000 
	resistivity 0.101000  
	gate_forming_layer false 
}
conductor "METAL_2" {
	min_spacing 0.280000
	min_width 0.280000 
	height 1.938000 
	thickness 0.557000 
	resistivity 0.101000  
	gate_forming_layer false 
}
conductor "METAL_3" {
	min_spacing 0.280000
	min_width 0.280000 
	height 3.036000 
	thickness 0.557000 
	resistivity 0.101000  
	gate_forming_layer false 
}
conductor "METAL_4" {
	min_spacing 0.280000
	min_width 0.280000 
	height 4.134000 
	thickness 0.557000 
	resistivity 0.101000  
	gate_forming_layer false 
}
conductor "METAL_5" {
	min_spacing 0.280000
	min_width 0.280000 
	height 5.232000 
	thickness 0.557000 
	resistivity 0.101000  
	gate_forming_layer false 
}
conductor "METAL_6" {
	min_spacing 0.460000
	min_width 0.440000 
	height 6.330000 
	thickness 1.040000 
	resistivity 0.045000  
	gate_forming_layer false 
}
dielectric "FOX" {
	conformal FALSE
	height 0.000000
	thickness 0.290000 
	dielectric_constant 4.000000 
}
dielectric "ILD" {
	conformal FALSE
	height 0.290000
	thickness 0.550000 
	dielectric_constant 3.900000 
}
dielectric "IMD1a" {
	conformal FALSE
	height 0.840000
	thickness 0.904000 
	dielectric_constant 3.700000 
}
dielectric "IMD1b" {
	conformal FALSE
	height 1.744000
	thickness 0.194000 
	dielectric_constant 4.200000 
}
dielectric "IMD2a" {
	conformal FALSE
	height 1.938000
	thickness 0.904000 
	dielectric_constant 3.700000 
}
dielectric "IMD2b" {
	conformal FALSE
	height 2.842000
	thickness 0.194000 
	dielectric_constant 4.200000 
}
dielectric "IMD3a" {
	conformal FALSE
	height 3.036000
	thickness 0.904000 
	dielectric_constant 3.700000 
}
dielectric "IMD3b" {
	conformal FALSE
	height 3.940000
	thickness 0.194000 
	dielectric_constant 4.200000 
}
dielectric "IMD4a" {
	conformal FALSE
	height 4.134000
	thickness 0.904000 
	dielectric_constant 3.700000 
}
dielectric "IMD4b" {
	conformal FALSE
	height 5.038000
	thickness 0.194000 
	dielectric_constant 4.200000 
}
dielectric "IMD5a" {
	conformal FALSE
	height 5.232000
	thickness 0.904000 
	dielectric_constant 3.700000 
}
dielectric "IMD5b" {
	conformal FALSE
	height 6.136000
	thickness 0.194000 
	dielectric_constant 4.200000 
}
passivation "PASS1" {
	conformal FALSE
	height 6.330000
	thickness 1.040000 
	dielectric_constant 4.200000 
}
passivation "PASS2" {
	conformal FALSE
	height 7.370000
	thickness 0.630000 
	dielectric_constant 7.900000 
}
via "CONT" {
	top_layer "METAL_1"
	bottom_layer "POLYCIDE" 
	contact_resistance 30.000000  
}
via "CONT" {
	top_layer "METAL_1"
	bottom_layer "N_SOURCE_DRAIN" 
	contact_resistance 30.000000  
}
via "CONT" {
	top_layer "METAL_1"
	bottom_layer "P_SOURCE_DRAIN" 
	contact_resistance 30.000000  
}
via "VA1" {
	top_layer "METAL_2"
	bottom_layer "METAL_1" 
	contact_resistance 20.000000  
}
via "VA2" {
	top_layer "METAL_3"
	bottom_layer "METAL_2" 
	contact_resistance 20.000000  
}
via "VA3" {
	top_layer "METAL_4"
	bottom_layer "METAL_3" 
	contact_resistance 20.000000  
}
via "VA4" {
	top_layer "METAL_5"
	bottom_layer "METAL_4" 
	contact_resistance 20.000000  
}
via "VA5" {
	top_layer "METAL_6"
	bottom_layer "METAL_5" 
	contact_resistance 13.000000  
}
